Publications

2 results for Hiroie Matsumoto

Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP)
- - Yannick Feurprier
  - Katie Lutker-Lee
  - et al.
- 2015
- SPIE Advanced Lithography 2015
Towards production ready processing with a state-of-the-art EUV cluster
- - Karen Petrillo
  - Nicole Saulnier
  - et al.
- 2015
- SPIE Advanced Lithography 2015

	
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