Publications

49 results for Hoa Truong

Development of TiO₂ containing hardmasks through plasma-enhanced atomic layer deposition
- - Anuja De Silva
  - Indira Seshadri
  - et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
DSA patterning options for logics and memory applications
- - Chi Chun Liu
  - Elliott Franke
  - et al.
- 2017
- SPIE Advanced Lithography 2017
DSA patterning options for FinFET formation at 7nm node
- - Chi Chun Liu
  - Elliott Franke
  - et al.
- 2016
- SPIE Advanced Lithography 2016
Customization and design of directed self-assembly using hybrid prepatterns
- - Joy Y. Cheng
  - Gregory S. Doerk
  - et al.
- 2015
- SPIE Advanced Lithography 2015
ICE: Ionic contrast enhancement for organic solvent negative tone develop
- - Linda K. Sundberg
  - Gregory M. Wallraff
  - et al.
- 2014
- SPIE Advanced Lithography 2014
Monitoring the evolution of Line Edge Roughness during resist development using an analog of quenched flow kinetics
- - M.I. Sanchez
  - L.K. Sundberg
  - et al.
- 2013
- SPIE Advanced Lithography 2013
Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling
- - Ramakrishnan Ayothi
  - Lovejeet Singh
  - et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
EUV mask line edge roughness
- - Amy E. Zweber
  - Emily Gallagher
  - et al.
- 2012
- SPIE Advanced Lithography 2012
Bound PAG resists: An EUV and electron beam lithography performance comparison of fluoropolymers
- - Luisa D. Bozano
  - Phillip J. Brock
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Self-assembly patterning for sub-15nm half-pitch: A transition from lab to fab
- - Chris Bencher
  - Jeffrey Smith
  - et al.
- 2011
- SPIE Advanced Lithography 2011